Predicate |
Object |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-3233 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32082 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-40 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31144 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0273 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0337 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3065 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3065 |
filingDate |
2007-06-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
grantDate |
2013-08-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationDate |
2013-08-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
JP-5271267-B2 |
titleOfInvention |
Mask layer processing method before performing etching process |
isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-104701159-B http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-104701159-A |
priorityDate |
2006-08-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |