http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-5226296-B2
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3065 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31116 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3065 |
| filingDate | 2007-12-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2013-07-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2013-07-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-5226296-B2 |
| titleOfInvention | Plasma etching method, plasma etching apparatus, control program, and computer storage medium |
| priorityDate | 2007-12-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 14.