http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-4956717-B2
Outgoing Links
| Predicate | Object |
|---|---|
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3065 |
| filingDate | 2008-12-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2012-06-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2012-06-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-4956717-B2 |
| titleOfInvention | Plasma processing method, etching method, plasma processing apparatus and etching apparatus |
| priorityDate | 2008-12-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 14.