| Predicate |
Object |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32183
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05H1-46
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32091 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-205
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3065
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05H1-46
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-509
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-31 |
| filingDate |
2010-03-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2012-01-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate |
2012-01-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-4852653-B2 |
| titleOfInvention |
Plasma processing apparatus, plasma processing method, and semiconductor device manufacturing method |
| priorityDate |
2010-03-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |