Predicate |
Object |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-285 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-022 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-28556 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3065 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-302 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-285 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-02 |
filingDate |
1998-11-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
grantDate |
2011-03-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationDate |
2011-03-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
JP-4642225-B2 |
titleOfInvention |
Pre-metallization cleaning and metallization in situ compatible with UHV semiconductor wafers |
priorityDate |
1997-11-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |