http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-4149002-B2
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T279-23 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67109 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-6831 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-68 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-683 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-68 |
| filingDate | 1997-09-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2008-09-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2008-09-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-4149002-B2 |
| titleOfInvention | Electrostatic chuck and method for controlling object temperature during plasma processing |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2014534614-A |
| priorityDate | 1996-09-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 41.