http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-4101280-B2

Outgoing Links

Predicate Object
classificationCPCAdditional http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L2924-0002
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J2237-3343
classificationCPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32935
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32963
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05H1-46
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3065
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L22-26
classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05H1-46
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05H1-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3065
filingDate 2007-02-16-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 2008-06-18-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationDate 2008-06-18-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-4101280-B2
titleOfInvention Plasma etching method and plasma etching apparatus capable of detecting end point
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2020179729-A1
priorityDate 2006-07-28-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

Incoming Links

Predicate Subject
isDiscussedBy http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419593449
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419559541
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID5461123
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID24556

Total number of triples: 22.