http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-3774115-B2
Outgoing Links
| Predicate | Object |
|---|---|
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3065 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-302 |
| filingDate | 2000-11-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2006-05-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2006-05-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-3774115-B2 |
| titleOfInvention | Method and apparatus for anisotropic etching of silicon |
| priorityDate | 2000-11-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
| Predicate | Subject |
|---|---|
| isDiscussedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419559541 http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID5461123 |
Total number of triples: 11.