http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-3082702-B2
Outgoing Links
Predicate | Object |
---|---|
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23F4-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-302 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3065 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05H1-46 |
filingDate | 1997-04-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
grantDate | 2000-08-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationDate | 2000-08-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | JP-3082702-B2 |
titleOfInvention | Plasma processing apparatus and metal wiring etching method |
priorityDate | 1996-07-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 19.