http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2995794-B2

Outgoing Links

Predicate Object
classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-306
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3065
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-302
filingDate 1990-04-09-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 1999-12-27-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationDate 1999-12-27-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-2995794-B2
titleOfInvention (III)-(V) Group Compound Semiconductor Substrate Etching Method
priorityDate 1990-04-09-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

Incoming Links

Predicate Subject
isDiscussedBy http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419523291
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID313
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID977
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID260
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419559516
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID24408
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419556587
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419559213
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419557048

Total number of triples: 19.