http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2984539-B2
Outgoing Links
| Predicate | Object |
|---|---|
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-302 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3065 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-28 |
| filingDate | 1994-04-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 1999-11-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 1999-11-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2984539-B2 |
| titleOfInvention | Dry etching method for silicon oxide film |
| priorityDate | 1994-04-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 18.