Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_98a75c9fff239084cf3c988c59841957 |
classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0228 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H10B51-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H10B53-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H10B51-30 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H10B53-30 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02274 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0228 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02345 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-405 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-401 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-45553 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-45536 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-45542 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-45527 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-45529 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-45531 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-45512 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-56 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02219 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02211 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02181 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02148 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-31 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-50 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-40 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-316 |
filingDate |
2021-07-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_435e7b44545b8d177176fea7bb4b6b25 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_01a38b61d46964b33cfeb7918af223c3 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_fcdefc0a07005ec4a18d33f4b026e365 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_188defd48490e70eee1f39ee7ae27955 |
publicationDate |
2021-11-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
JP-2021182632-A |
titleOfInvention |
A novel formulation for the deposition of silicon-doped hafnium oxide as a ferroelectric material |
abstract |
PROBLEM TO BE SOLVED: To deposit both a silicon-containing fragment and a hafnium-containing fragment on a surface having a hydroxyl group to deposit a silicon-doped hafnium having a silicon doping amount in the range of 0.5 to 8 mol%. Providing formulations or compositions comprising both organic aminohafnium and organic aminosilane precursor compounds solves the problems associated with conventional precursors and methods. In one aspect, the invention implants both a silicon-containing fragment and a hafnium-containing fragment on a given surface having a hydroxyl group, making it suitable for ferroelectric materials 0.5-8. A formulation comprising both organic aminohafnium and an organic aminosilane precursor compound that deposits silicon-doped hafnium oxide with a mol% silicon doping amount. In another aspect, the invention is a method and apparatus for depositing a silicon-doped hafnium oxide film as a ferroelectric material using the formulation. [Selection diagram] Fig. 2 |
priorityDate |
2017-03-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |