http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2021105174-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_6c8d4dc7bd1a30d8fda907fceaeb4e69 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C11D7-22 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-304 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G73-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L79-00 |
| filingDate | 2021-03-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3ea641a5802224e79843811aa144c65f http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1975d04c934d29aa3d5bde86449905d7 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1ae337fc5197a2ddd70e5eed0d6ac836 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_646e54456e3454087250b1a9e41270da |
| publicationDate | 2021-07-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2021105174-A |
| titleOfInvention | Detergents, and methods for manufacturing flat panel display substrates and semiconductor device substrates |
| abstract | PROBLEM TO BE SOLVED: To provide a cleaning agent having low corrosiveness to metal, less likely to foam during cleaning, preventing metal contamination on a substrate, and having no pH restriction at the time of use, and a method for manufacturing a flat panel display substrate and a semiconductor device substrate. SOLUTION: The cleaning agent of the present invention contains an aniline-based polymer having a unit represented by the following general formula (1) and having an acidic group content of 80 mol% or more with respect to an aromatic ring, and water. .. < In the formula (1), R 1 to R 4 are independently hydrogen atoms, linear or branched alkyl groups having 1 to 24 carbon atoms, linear or branched alkoxy groups having 1 to 24 carbon atoms, and acidic groups. , A hydroxy group, a nitro group, and a halogen atom, and at least one of R 1 to R 4 is an acidic group. Here, the acidic group is a sulfonic acid group or a carboxy group. [Selection diagram] None |
| priorityDate | 2017-05-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
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