http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2021008669-A

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assignee http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_6c8d4dc7bd1a30d8fda907fceaeb4e69
classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05H1-24
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-509
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B65D23-02
filingDate 2020-09-29-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d96826289b927aac62cc2bb0cb805367
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1038692557a6df7341a5a6d5131ab9f4
publicationDate 2021-01-28-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-2021008669-A
titleOfInvention Gas barrier film forming apparatus and film forming method and manufacturing method of plastic container with gas barrier film
abstract PROBLEM TO BE SOLVED: To manufacture a plastic container having a high gas barrier property by uniformly forming a gas barrier film by a plasma CVD method inside a container having a small inner diameter of the mouth portion and a height higher than the inner diameter of the mouth portion. To do. SOLUTION: When a plastic container 1 is housed in a recess 2A of a first electrode 2 in which a recess 2A for accommodating the bottom of the plastic container 1 is formed, a body portion and a recess of the plastic container 1 are formed. A conductor member 11 and / or a dielectric member 12 is provided between the 2A and the conductor member 11 so as to satisfy a specific condition. After exhausting the inside of the plastic container 1, the raw material gas is supplied, and a high frequency voltage is applied between the first electrode 2 and the second electrode 3 to turn the raw material gas into plasma, and a gas barrier film is formed on the inner surface of the plastic container 1. Is formed. [Selection diagram] Fig. 1
priorityDate 2020-09-29-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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