| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_2fb272959740a2231f287ac6bf4d190a |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-677
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05H2242-26 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05H1-46
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32733
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32935
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-345
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-45534
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-45542
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-45546
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67242
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67017
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32183
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-505 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-318
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-505
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-31
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05H1-46 |
| filingDate |
2020-05-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2a082f31529d309d680ed29c706948e2 |
| publicationDate |
2020-10-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-2020167166-A |
| titleOfInvention |
Substrate processing equipment, plasma generators, semiconductor equipment manufacturing methods and programs |
| abstract |
PROBLEM TO BE SOLVED: To provide a technique capable of performing stable plasma generation. SOLUTION: A processing chamber for processing a substrate, a high frequency power supply for supplying power, and a buffer structure for generating plasma are provided, and the buffer structure includes at least two first electrodes connected to the high frequency power supply, and at least the above. A plasma generation unit having a second electrode arranged between the two first electrodes and grounded, a matching device for matching the load impedance of the plasma generation unit with the output impedance of the high-frequency power supply, and Provided is a technique including an adjusting unit that adjusts a matching unit so that the load impedance of the plasma generating unit and the output impedance of a high-frequency power supply match. [Selection diagram] Fig. 3 |
| priorityDate |
2017-08-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |