| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_98a75c9fff239084cf3c988c59841957 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09G1-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02164
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0217
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B24B37-044
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K3-1436
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31051
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31053 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09G1-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-304
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08K9-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L89-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B24B37-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08K3-01
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09K3-14 |
| filingDate |
2020-01-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4f29b3a181d1b7c15a7b495d0a4be2d4
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5355b61940d8d3d8c1adf36b1bb7af62
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e125defb41f290427cf107314df59752
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_cbc4e85e963216bd77e51338e2842080
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f6d53f6a0cae9f6c4043bf21817ae8b0 |
| publicationDate |
2020-08-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-2020117709-A |
| titleOfInvention |
Shallow Trench Isolation (STI) Chemical Mechanical Planarization (CMP) Polishing with a combination of low abrasive concentration and chemical additives |
| abstract |
PROBLEM TO BE SOLVED: To provide a shallow trench isolation (STI) chemical mechanical planarization (CMP) polishing composition, a method and an apparatus using the same. The CMP polishing composition includes an abrasive of ceria-coated inorganic oxide particles such as ceria-coated silica; and a dual chemical additive to provide high oxide film removal rates. Dual chemical additives include gelatin compounds that have negative and positive charges on the same molecule and nonionic organic molecules that have multiple hydroxyl functional groups in the same molecule. [Selection diagram] None |
| priorityDate |
2019-01-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |