Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_bce787970b69aeb08d159e7c101c9ed7 |
classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02126 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J2237-3341 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-6831 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32587 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-0245 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67207 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67167 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32532 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32091 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67069 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32715 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31144 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32477 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31116 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3105 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31105 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32357 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3065 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3065 |
filingDate |
2020-01-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_11897270b1340382d45cb72366fe97c9 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b1cbc915edc506f8d44a0bc81ddceaaf http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3d234124be7e513dda348c4f8808368e http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b0060c77f6bc3033ea8ce667d9b08a80 |
publicationDate |
2020-05-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
JP-2020074452-A |
titleOfInvention |
Processing chamber for etching low K and other dielectric films |
abstract |
Methods and processing chambers for etching low-k and other dielectric films. A method with an etching chamber having a plurality of chamber regions for alternating generation of different plasmas includes modifying a portion of a low-k dielectric layer by plasma treatment. The modified portion of the low k dielectric layer is selectively etched over the mask layer and the unmodified portion of the low k dielectric layer. A first charge coupled plasma source is provided to generate an ion flux on the workpiece in one mode of operation. A secondary plasma source is provided to provide the reactant species flux to the workpiece in another mode of operation without significant ion flux. The controller operates to cycle through the modes of operation repeatedly over time to remove the desired cumulative amount of dielectric material. [Selection diagram] Figure 2 |
priorityDate |
2011-10-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |