http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2019201168-A

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Predicate Object
assignee http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_30208fce9ca36e03cb3cb8a1259170bc
classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05H1-46
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23F4-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3065
filingDate 2018-05-18-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ed08aa73124b4d27b3d9cd69bfe15d53
publicationDate 2019-11-21-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-2019201168-A
titleOfInvention Local dry etching equipment
abstract In a local dry etching apparatus, a local dry etching process can be performed by correcting the etching rate so as to be kept constant based on the pressure of the plasma generation unit, the accumulated use time, and the elapsed start time, resulting in a processing error. To reduce. In the local dry etching apparatus, a pressure gauge 61 is provided in the vicinity of the plasma generating part 21 of the discharge tube 2 and upstream thereof in order to detect the pressure of the plasma generating part 21. The etching rate calculator 62 is a function obtained in advance, and based on the etching rate function 63 representing the correspondence between the pressure of the plasma generation unit 21 and the etching rate, the etching rate is calculated from the measured value of the pressure gauge 61. Further, the correction is made according to the accumulated use time of the discharge tube and the elapsed start time. The electromagnetic wave output control device 66 controls the output of the electromagnetic wave transmitter 10 based on the calculated value of the etching rate calculator 62 so that the etching rate becomes constant. [Selection] Figure 3
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2022254677-A1
priorityDate 2018-05-18-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-H10147893-A
isDiscussedBy http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID17358
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419527022

Total number of triples: 16.