http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2019124941-A
Outgoing Links
Predicate | Object |
---|---|
assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_24aca9ded2638ea793d05360dde7a4a0 |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07D233-60 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 |
filingDate | 2019-01-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a144f3526dc1d67cb5c2c69f8714bf36 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_153d9ab45d90d19234e4e5282fb77563 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a8ac7648a276cd4ba366342dec24a428 |
publicationDate | 2019-07-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | JP-2019124941-A |
titleOfInvention | Resist composition, method of producing resist pattern, and compound |
abstract | An object of the present invention is to provide a resist composition and a compound capable of producing a resist pattern with an excellent focus margin. A compound represented by Formula (I), a resin containing a structural unit having an acid labile group, a resin containing a structural unit having a fluorine atom, an acid generator, and a table of Formula (I) A resist composition containing the compound to be Wherein, L 1 represents a single bond or a divalent hydrocarbon group; W 1 is a hydrocarbon ring; n is an integer 1 to 3; R 1 and R 2 are fluorinated alkyl groups, respectively; R 3 is Represents a hydrogen atom or a hydrocarbon group which may have a substituent. -CH 2- contained in the hydrocarbon group may be replaced by -O-, -S-, -S (O) 2 -or -CO-. 【Selection chart】 None |
priorityDate | 2018-01-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 242.