Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_24aca9ded2638ea793d05360dde7a4a0 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F220-28 |
filingDate |
2012-04-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_670712e4c98df4c464bc1ac57747e207 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_316dc9ef3e33bc1aace42938b037bf4a http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a144f3526dc1d67cb5c2c69f8714bf36 |
publicationDate |
2012-11-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
JP-2012226335-A |
titleOfInvention |
Resist composition and method for producing resist pattern |
abstract |
A resist composition having an excellent exposure margin and a mask error factor and capable of obtaining a resist pattern with few occurrences of defects is provided. (A1) a resin having a structural unit represented by formula (I), (A2) a resin that is insoluble or hardly soluble in an aqueous alkali solution and can be dissolved in an aqueous alkaline solution by the action of an acid, and (B) an acid A resist composition comprising at least one selected from the group consisting of a generator and a compound represented by (D) the formula (II1) and the compound represented by the formula (II2). [Selection figure] None |
isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2019124941-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-WO2016027546-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2015024978-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-7217154-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2012190008-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2014191121-A |
priorityDate |
2011-04-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |