http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2019119848-A
Outgoing Links
Predicate | Object |
---|---|
assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_89afae566b725ae78e20cf972d9bcdc7 |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09D5-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09D7-61 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09D7-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09D163-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B05D7-24 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B05D7-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B05D5-06 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B05D3-12 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B05D3-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B05D3-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B05D1-26 |
filingDate | 2018-10-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a94ad2454631c4e26d3471c10e56b9e3 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3d3736abfdbff358789ddcf9633764d9 |
publicationDate | 2019-07-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | JP-2019119848-A |
titleOfInvention | Composition for forming a cured film, and method for forming a cured film |
abstract | PROBLEM TO BE SOLVED: To form a cured film while suppressing defects on the surface even if the coating film is formed using a slit coating method or the like in which surface defects such as unevenness, streaks, and pin marks easily occur. It is possible to provide a composition for forming a cured film comprising an epoxy compound (A) and hollow silica (B), and a method for forming a cured film using the composition for forming a cured film. When a cured film is formed using a composition containing an epoxy compound (A), hollow silica (B) and a solvent (S), a surfactant (C) is added to the composition. And, as the solvent (S), one or more high boiling point solvents (SH) having a boiling point of 170 ° C. or higher at atmospheric pressure are used. 【Selection chart】 None |
priorityDate | 2017-12-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 346.