http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2019085554-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_6c8d4dc7bd1a30d8fda907fceaeb4e69 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F24-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038 |
| filingDate | 2018-08-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_710ee2437c09d62b7a16b10562c71b24 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9321233e237e29e730fc4a09108724fc http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_264091a4ee7420f6c3cd2bd98f7f1f62 |
| publicationDate | 2019-06-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2019085554-A |
| titleOfInvention | Polymer, resist composition, and method for producing patterned substrate |
| abstract | To provide a polymer suitable as a resist material in a development process using an organic solvent as a developer. A mixed liquid comprising n-heptane or methanol in 100 parts by mass of a PGMEA solution containing 20% by mass of the polymer, which is a polymer containing a monomer unit represented by the formula (1) The amount of n-heptane added is 8.0 to 50.0 parts by mass when the turbidity of 10 NTU is reached, and the amount of methanol added is 26.0 to 130.0 parts by mass when 5 NTU is reached A polymer. In the formula, n is an integer of 0 or 1 to 4, m is an integer represented by 2 (n + 1), and m Rs are each independently a hydrogen atom, an alkyl group or an acid-degradable group. [Chemical formula 1] 【Selection chart】 None |
| priorityDate | 2017-11-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 121.