http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2019057615-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_a665d61597c2731ab4130971ee397dc9 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-304 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B24B37-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09K3-14 |
| filingDate | 2017-09-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c178f49a40294aa670201b7473eb7898 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0315e50f70de1e5ccf920b539d438267 |
| publicationDate | 2019-04-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2019057615-A |
| titleOfInvention | Polishing composition, method for producing the same, and polishing method |
| abstract | An object of the present invention is to provide a polishing composition capable of reducing the polishing rate of a specific polishing object among polishing objects such as simple silicon, silicon compounds, and metals. A polishing composition according to one embodiment of the present invention includes a polishing inhibitor containing a compound having a ring structure and having three or more anionic functional groups bonded to the ring structure, or a salt thereof. , Containing abrasive grains and a liquid medium. [Selection] Figure 1 |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2023032930-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20220122515-A |
| priorityDate | 2017-09-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 182.