| abstract |
A method is provided for depositing a flowable film comprising SiO or SiN. One particular method involves exposing the substrate surface to a siloxane or silazane precursor, exposing the substrate surface to a plasma activated coreactant to provide a SiON interlayer, and curing the SiON interlayer by UV curing. Providing a cured intermediate film and annealing the cured intermediate film to provide a film comprising SiO or SiN. |