http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2018177889-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_268be9afa00cf55b5aa72b1612151ecb |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05K3-06 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F2-06 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G06F3-041 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F220-26 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07D307-20 |
| filingDate | 2017-04-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_82a68f1f9120d45249b03b55b724d7b8 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_aedee7414180fb2af1605aa79345b279 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e1058fc25b4afc625170f0e9a240975b http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a7bc6852c8a3777d80bfd006e6166315 |
| publicationDate | 2018-11-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2018177889-A |
| titleOfInvention | Method of producing polymer solution for photosensitive transfer material, method of producing composition for photosensitive transfer material, method of producing photosensitive transfer material, method of producing circuit wiring, and method of producing touch panel |
| abstract | The present invention relates to a method for producing a polymer solution for a photosensitive transfer material capable of obtaining a pattern excellent in resolution, a method for producing a composition for a photosensitive transfer material, a method for producing a photosensitive transfer material, and a method for producing a circuit wiring Or, provide a method of manufacturing a touch panel. SOLUTION: A polymerization solvent component containing a polymerization initiator and a polymerization solvent and having a vapor pressure of 1 kPa or more and 16 kPa or less at 20 ° C., and at least one single type having an acid-degradable group-protected acid group. Method for producing a polymer solution for photosensitive transfer material, method for producing a composition for photosensitive transfer material, photosensitive transfer material, having a step of carrying out a polymerization reaction in a composition containing a monomer component containing a monomer , A method of manufacturing a circuit wiring, or a method of manufacturing a touch panel. [Selected figure] Figure 2 |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2022145158-A1 |
| priorityDate | 2017-04-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 209.