| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_d80f1040809503e54509c871ba828f75 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-3211
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32449
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67069
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32834
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-027 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-205
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-31
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3065
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-455 |
| filingDate |
2017-12-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_bde8afdd7fb1e238a74442a17ff667f0
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_94d21693f4dff7dc0484a9b7b5fa3ff1
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3993634f362ff8cfc24e5d92d5664314
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0af0669753fdfd0f250a80274462ac79
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0e9e984b972994c99e481b8f6dc15178 |
| publicationDate |
2018-08-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-2018121051-A |
| titleOfInvention |
Plasma processing equipment |
| abstract |
Provided is a plasma processing apparatus capable of adjusting a component of a processing gas for each of a plurality of gas shower head units while using a common processing gas raw material supply unit. In a plasma processing apparatus that performs plasma processing on a substrate to be processed, first and second processing gases are supplied to a processing space that houses a mounting table on which the substrate to be processed is placed. First and second supply flow rate adjusting parts 41a and 41b are provided in the first and second process gas raw material supply parts 4a and 4b, respectively, for supplying the raw material, and a plurality of gas shower head parts 30a to 30d. For the first and second distribution flow paths 401 and 402 for distributing the first and second process gas raw materials, the first and second distribution flow rate adjusting units 421a to 424a are respectively provided. , 421b to 424b. [Selection] Figure 3 |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-7296854-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-112713074-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-112713074-B |
| priorityDate |
2017-01-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |