http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2018049902-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_669c01133740c5233f2c8738904ea3af http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_82cbc291d77c061ac9a216f86ec010a3 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B29C59-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3065 |
| filingDate | 2016-09-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_831cd117576f5c946a45b305ba38e9f2 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9954d9a755edb4c057f7dc6975a27393 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8a83e7564ade6c040d9f063751178331 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_205d166119bc9492e2333de4a546679d http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0243dfb95cfebd62568371980740aa67 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b8fa9dd5f5785ee7717e62ba76922865 |
| publicationDate | 2018-03-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2018049902-A |
| titleOfInvention | PATTERN FORMING METHOD AND METHOD FOR MANUFACTURING Rough Structure |
| abstract | Kind Code: A1 A method for forming a concavo-convex pattern having an etching resistance enough to function sufficiently as an etching mask even with a fine dimension by an imprint method and a method for manufacturing a concavo-convex structure using the same. provide. A pattern forming method includes preparing a base material having a first surface and a second surface, and an imprint mold having a pattern forming surface on which a concavo-convex pattern is formed. A resin pattern having a plurality of convex portions, a plurality of concave portions, and a remaining film portion located at the bottom of the concave portion is formed by interposing an active energy ray curable resin between the pattern forming surface of the print mold. A step of forming, a step of removing the remaining film portion, a step of exposing the resin pattern from which the remaining film portion has been removed to a first gas containing an inorganic compound exhibiting Lewis acidity under predetermined conditions, and an oxidant thereafter. Exposing the resin pattern to a second gas contained. [Selection] Figure 1 |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2020050090-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-7242463-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2021515407-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2021054284-A1 |
| priorityDate | 2016-09-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 55.