| Predicate |
Object |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B08B9-00 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D11-0064
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-6704
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D7-32
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B08B9-08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02052
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D7-08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D11-0047
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D7-10 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-304
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
| filingDate |
2014-11-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate |
2017-02-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-2017504182-A |
| titleOfInvention |
Improved chamber cleaning when using acidic chemicals to fabricate microelectronic devices and their precursors |
| abstract |
The present invention provides a processing strategy that reduces contamination on the surface of wafers that are processed using acidic chemicals. These strategies are suitable for use on a wide variety of wafers, including those containing sensitive microelectronic features or precursors thereof. These strategies neutralize residual acids and acid byproducts that can cause contamination quickly and effectively from the front side of one or more workpieces and from the surface of other processing chambers. And a combination of rinse strategies. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2022181398-A1 |
| priorityDate |
2013-11-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |