| abstract |
An object of the present invention is to provide a resist composition capable of producing a resist pattern with a good mask error factor and good CD uniformity. A resist composition comprising a resin containing at least one structural unit having an acid labile group and an acid generator, wherein the structural unit having at least one acid labile group is based on butyl acetate. , A structural unit derived from a monomer having an acid labile group having a solubility index (R) of 3.0 or more and 5.0 or less represented by the Hansen solubility parameter represented by the formula (1), A resist composition having a structural unit derived from at least one monomer having an acid labile group having a solubility index difference (ΔR) before and after separation of 5.0 or more. R = (4 (δd-15.8) 2+ (δp-3.7) 2+ (δh-6.3) 2) 1/2 (1) (wherein δd, δp and δh are respectively (Dispersion term, polar term and hydrogen bond term in Hansen solubility parameter are shown.) [Selection] None |