abstract |
The present invention provides a resist composition in which occurrence of pattern collapse is suppressed and a finer pattern can be formed with a good shape. A resist composition that generates an acid upon exposure and changes its solubility in a developing solution by the action of an acid, wherein the base material component (A) changes its solubility in a developing solution by the action of an acid. And a compound (D1) represented by the general formula (d1). In general formula (d1), Z- represents an anion having a hydroxybenzoic acid skeleton, wherein at least one hydrogen atom of the aromatic ring is substituted with a halogen atom. m is an integer of 1 or more, and Mm + represents an m-valent organic cation. [Chemical 1] [Selected figure] None |