| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_9ec030fc062b270c25327af9127bed3a |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-304
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-30625
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3065
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-6831
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-6833
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-68721
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-68757 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3065
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-683
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H02N13-00 |
| filingDate |
2015-09-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_531e29427810ca5d2ba60f178c90de88 |
| publicationDate |
2017-03-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-2017050468-A |
| titleOfInvention |
Electrostatic chuck device and method of manufacturing electrostatic chuck device |
| abstract |
An electrostatic chuck device capable of suppressing erosion of an electrostatic chuck substrate is provided. An electrostatic chuck device includes a base plate, an electrostatic chuck substrate bonded to an upper surface of the base plate, an electrostatic electrode provided in the electrostatic chuck substrate, and a base plate. The focus ring 50 is provided on the upper surface 20 </ b> A and covers the side surface of the electrostatic chuck substrate 40. The electrostatic chuck device 10 includes a groove portion 41X formed on the upper surface 41A of the electrostatic chuck substrate 40 exposed in a region between the focus ring 50 and the placement region A1 on which the substrate W is placed, and a groove portion 41X. And a filled protective layer 60. The groove portion 41X is provided at a position that does not overlap the electrostatic electrode 42 in plan view. The protective layer 60 is made of a material having higher plasma resistance than the material constituting the electrostatic chuck substrate 40. [Selection] Figure 1 |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-7266524-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-6506494-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-7083033-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20200116167-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-102445266-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2019239946-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-7101055-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-111095496-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2020504452-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2019216163-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20190010125-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11223302-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2021516445-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-102021353-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2023182048-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-111819678-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20220034677-A |
| priorityDate |
2015-09-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |