http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2017049348-A
Outgoing Links
Predicate | Object |
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assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_f0167679416d3535b7e2c58cdaa9df52 |
classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-038 |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F299-00 |
filingDate | 2015-08-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_031298ae4894ba085cf9b9472ce11deb |
publicationDate | 2017-03-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | JP-2017049348-A |
titleOfInvention | Active energy ray-curable composition for photoresist |
abstract | PROBLEM TO BE SOLVED: To provide an active energy ray curable composition for a photoresist having excellent heat stability and good curability even when cured. An active energy ray-curable composition for a photoresist containing an acrylic copolymer resin (A), an acrylic copolymer resin (B), and a photopolymerization initiator (C), The acrylic copolymer resin (A) is an acrylic copolymer resin having a (meth) acryloyl group and a carboxyl group in the side chain, The acrylic copolymer resin (B) is an acrylic copolymer resin having a (meth) acryloyl group and a carboxyl group in the side chain and having a resin skeleton different from that of the acrylic copolymer resin (A). An active energy ray-curable composition for resist. [Selection figure] None |
priorityDate | 2015-08-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 190.