http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2016539497-A

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filingDate 2014-09-22-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationDate 2016-12-15-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-2016539497-A
titleOfInvention Maskless hybrid laser scribing and plasma etching wafer dicing
abstract Maskless hybrid laser scribing and plasma etching wafer dicing processes are described. In one embodiment, a method of dicing a semiconductor wafer having a front surface overlaid with a plurality of integrated circuits, having a passivation layer disposed therebetween, and covering a metal pillar / solder bump pair of the integrated circuit is disclosed. Laser scribing of the passivation layer without the use of a mask layer. The method also includes plasma etching the semiconductor wafer with a scribe line to singulate the integrated circuit, and the passivation layer protects the integrated circuit during at least a portion of the plasma etch. The method also includes thinning the passivation layer to partially expose the metal pillar / solder bump pairs of the integrated circuit. [Selection] Figure 3D
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http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-111656491-A
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http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10910270-B2
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