| Predicate |
Object |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-343
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-325 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B41M5-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2016
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2014
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-16
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-11
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2002
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-202
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-24
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-38
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B41C1-00 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B32B27-18
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B32B27-16
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L33-14
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-32
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L1-18 |
| filingDate |
2014-04-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate |
2016-08-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-2016524718-A |
| titleOfInvention |
Mask-forming image-forming material and relief image manufacturing method using the same |
| abstract |
A mask image is formed using the imageable material to provide a relief image. The imageable material has a simplified structure and consists essentially of a barrier layer comprising: a transparent polymeric carrier sheet and a first infrared absorbing compound. The first UV absorbing compound is provided in the transparent polymeric carrier sheet or barrier layer. The non-silver halide thermosensitive image-forming layer is disposed on the barrier layer and includes a second infrared absorbing compound and a second ultraviolet absorbing compound. A relief image is formed by imaging an imageable material, forming an imaged mask material, exposing the relief forming material through the imaged mask material using a curing line, and exposing and unexposed areas. It is formed by the step of forming a region and the step of developing the image-formed relief forming material by removing the non-exposed region to form a relief image. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-7022128-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-7290038-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2022138714-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2022138713-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2020131616-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2019537063-A |
| priorityDate |
2013-04-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |