Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_a665d61597c2731ab4130971ee397dc9 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09G1-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K3-1463 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B24B37-044 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3212 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-304 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09K3-14 |
filingDate |
2013-09-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9c7df139bb8b8a4400ab8cda5a63fb4a http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_bb61b9779224e610d893341260a717b1 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_548261b667c46c3d0d013a70c67a06a4 |
publicationDate |
2016-11-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
JP-2016193955-A |
titleOfInvention |
Polishing composition |
abstract |
An object of the present invention is to provide a polishing composition capable of reducing organic residues and improving the yield of semiconductor device production. A polishing composition used for polishing an object to be polished, comprising at least one of a metal anticorrosive and a surfactant; an oxidizing agent; and an organic compound, wherein the organic compound is hydroxy A polishing composition having 2 to 3 groups is provided. [Selection figure] None |
isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-114437634-A |
priorityDate |
2013-09-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |