http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2016127065-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_268be9afa00cf55b5aa72b1612151ecb |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23F1-26 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-28 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-308 |
| filingDate | 2014-12-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_537ee292a59c5ba6f3651451048627d7 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_881a80009d01d6e88b3952fd5db31a52 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0ef58a1bb9ec60924e5ac12d9a312802 |
| publicationDate | 2016-07-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2016127065-A |
| titleOfInvention | Etching solution, etching method using the same, and method for manufacturing semiconductor substrate product |
| abstract | An etching solution capable of removing titanium on a substrate is provided. Furthermore, if necessary, an etching solution that can selectively remove a layer containing titanium while suppressing damage to a layer containing silicon and / or germanium on the substrate, particularly a silicide layer thereof, and etching using the same A method and a method for manufacturing a semiconductor substrate are provided. Furthermore, an etching solution that achieves the above-described excellent titanium removability by suppressing damage to each metal or composite compound layer applied to the production of a semiconductor substrate such as W, TiN, TiAlC, etc., as required. An etching method and a method for manufacturing a semiconductor substrate are provided. An etching solution for removing titanium by being applied to a substrate containing titanium and silicon and / or germanium, which contains fluorine ions and an oxidizing agent. [Selection figure] None |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2023054233-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-6993998-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-102160019-B1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I714013-B http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20190041492-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-WO2018061582-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2019194580-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2018061582-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2018061670-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2019165218-A |
| priorityDate | 2014-12-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 145.