| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_8cf8d77ac0eff1767b22d2fb9445b64d |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H10B43-27 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0332
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0337
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H10B41-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31144
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02282 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L27-115
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-336
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L29-792
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L29-788
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3065
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-8247 |
| filingDate |
2015-11-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_248cbdd2a1034f7dee5806fede6b9e88 |
| publicationDate |
2016-06-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-2016105465-A |
| titleOfInvention |
Plating metal hard mask for vertical NAND hole etching |
| abstract |
A method for forming recess features (structures) on a substrate with a high aspect ratio is provided. Formed in the context of fabricating a vertical NAND (VNAND) memory device. Depositing a sacrificial post 302c on the metal seed layer 310 covering the underlying material stack 301 and shaping it; electroplating or electrolessly plating a metal hard mask material 320 around the sacrificial post 302c; It involves removing the sacrificial post 302c and etching the underlying material stack 301 to form a high aspect ratio recess feature. [Selection] Figure 3D |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-7229929-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2019145615-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10872782-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-7037384-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-7222940-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-7194725-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11270893-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2020507922-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2020532870-A |
| priorityDate |
2014-11-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |