abstract |
A hard-baked resist film is more than necessary for polymerization of a novolac resin and a DNQ compound, and is firmly fixed to a metal film as a base. For this reason, there are cases in which a hard-baked resist film cannot be peeled off with a common resist stripping solution that can peel off the resist film on the Cu film, Cu / Mo film, and Al film. A resist stripping solution comprising a cyclic amine, a polar solvent, water, a sugar alcohol, and a reducing agent, and particularly as a cyclic amine, pyrrolidine or a substituent at the 3-position of pyrrolidine There is provided a resist stripping solution using at least one of the compounds bonded with hydrazine as a reducing agent. [Selection figure] None |