http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2016092006-A

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filingDate 2015-10-27-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9b550d690be9c147f6018735faf59ff8
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publicationDate 2016-05-23-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-2016092006-A
titleOfInvention Method and apparatus for providing an anisotropic monochromatic neutral beam with a non-dipolar electron plasma
abstract A method and apparatus for providing an anisotropic monochromatic neutral beam with a non-dipolar electron plasma that overcomes trade-offs between etch efficiency, microloading, charge damage, TMP flow rate, and / or these parameters. . An NB-NEP apparatus 50 generates a first plasma dielectric tube / chamber 58 that generates a first plasma at a first plasma potential, and generates a second plasma at a second plasma potential that is higher than the first plasma potential. A second plasma dielectric tube / chamber 64 is included. The second plasma is generated by using an electron flux from the first plasma. Furthermore, it has a dielectric (insulator) neutralizer grid 72 that is not grounded. The neutralizer grid 72 is configured to expose a substantially anisotropic neutral beam traveling from the neutralizer grid 72 to the substrate in the second plasma dielectric tube / chamber 64. [Selection] Figure 3
priorityDate 2014-10-31-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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Total number of triples: 24.