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filingDate 2015-06-04-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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publicationDate 2016-02-18-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-2016027624-A
titleOfInvention Plasma-resistant member and manufacturing method thereof
abstract An object of the present invention is to provide a plasma-resistant member capable of reducing particles and stably maintaining a chamber condition. A yttria polycrystal comprising a base material and a layered structure having a plasma resistance including a yttria polycrystal formed on the surface of the base material by an aerosol deposition method. The body has a crystal structure in which a cubic crystal and a monoclinic crystal are mixed, and the ratio of the monoclinic crystal to the cubic crystal in the yttria polycrystal constituting the layered structure is 0% or more and 60% or less. And a crystallite size of the yttria polycrystal constituting the layered structure is 8 nm or more and 50 nm or less. [Selection] Figure 1
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priorityDate 2014-06-26-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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