| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_32681f1832d227fe8df23d12a37f67a8 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C04B41-87
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-205
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3065
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05H1-46
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C24-04 |
| filingDate |
2014-06-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f8cee38675af9362cc6d8434d9ed7d41 |
| publicationDate |
2016-01-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-2016008352-A |
| titleOfInvention |
Plasma resistant material |
| abstract |
An object of the present invention is to provide a plasma-resistant member capable of reducing particles and stably maintaining a chamber condition. A yttria polycrystal comprising a base material and a layered structure having a plasma resistance including a yttria polycrystal formed on the surface of the base material by an aerosol deposition method. The crystal structure of the body is a mixture of cubic and monoclinic crystals, the ratio of monoclinic to cubic crystals is 60% or less, and the crystallite size of the yttria polycrystal constituting the layered structure is 50 nm or less A plasma-resistant member is provided. [Selection] Figure 1 |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2018051974-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-108780750-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-108780750-B
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2018046278-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11047035-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2023182747-A1 |
| priorityDate |
2014-06-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |