| abstract |
A cleaning method for a UV chamber includes supplying a first cleaning gas, a second cleaning gas, and a purge gas to one or more openings in the chamber. The first cleaning gas can be an oxygen-containing gas, such as ozone, to remove carbon residues. The second cleaning gas can be a remote plasma of NF 3 and O 2 to remove silicon residues. The UV chamber can have two UV transparent showerheads, with the UV window in the chamber lid, defining a gas volume close to the UV window and defining a distribution volume below the gas volume. The purge gas can flow through the gas volume, while one or more cleaning gases flow into the distribution volume so that they do not impinge on the UV transparent window. [Selection] Figure 1 |