http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2015503841-A
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B08B7-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02041 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-4405 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-44 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-4401 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-0227 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-304 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3065 |
| filingDate | 2012-12-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2015-02-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2015503841-A |
| titleOfInvention | Method and apparatus for cleaning a substrate surface using atomic hydrogen |
| abstract | Provided herein are methods and apparatus for cleaning a substrate surface. In some embodiments, a method for cleaning a surface of a substrate includes supplying a hydrogen-containing gas to a first chamber having a plurality of filaments disposed therein and passing a current through the plurality of filaments. Increasing the temperature of the plurality of filaments to a process temperature sufficient to decompose at least a portion of the hydrogen-containing gas and exposing the substrate to hydrogen atoms formed from the decomposed hydrogen-containing gas for a period of time. Cleaning the surface of the substrate. [Selection] Figure 1 |
| priorityDate | 2011-12-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 45.