http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2015155566-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_696ca0ae93d5cf5a686273601361781f |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-288 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C18-34 |
| filingDate | 2014-02-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4b95222a5953c6e52ab151e6e201e095 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2579176f36b6d5d3999ef621d14eb582 |
| publicationDate | 2015-08-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2015155566-A |
| titleOfInvention | Electroless plating solution |
| abstract | [PROBLEMS] To change the film quality of a cobalt film, a cobalt alloy film, a nickel film, and a nickel alloy film by adding an unprecedented speed regulator without changing the composition of a basic plating solution. Providing an electroless plating solution that can increase the plating rate without causing the plating to occur. SOLUTION: Cobalt ions or nickel ions, a complexing agent, a reducing agent, and a pH adjusting agent are added so that the pH value is 7 to 13, and 0.01 to 1% by mass of an amino acid is added as a rate adjusting agent. Electroless plating solution characterized by [Selection figure] None |
| priorityDate | 2014-02-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 89.