http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2015135527-A

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filingDate 2015-04-24-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_be835a103388ce1c8816005f37adda0b
publicationDate 2015-07-27-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-2015135527-A
titleOfInvention Compositions and methods for immersion lithography
abstract A novel photoresist composition useful for immersion lithography is provided. Preferred photoresist compositions of the present invention comprise one or more substances that are substantially immiscible with the resin component of the resist. Further preferred photoresist compositions of the present invention comprise 1) Si substitution, 2) fluorine substitution; 3) hyperbranched polymer; and / or 4) polymer particles. Particularly preferred photoresists of the present invention can reduce leaching of the resist material into the immersion liquid in contact with the resist layer during the immersion lithography process. [Selection figure] None
priorityDate 2005-05-01-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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