http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2014507795-A
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-11 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T428-24612 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-40 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0035 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0337 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0338 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D5-00 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3065 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-26 |
| filingDate | 2011-12-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2014-03-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2014507795-A |
| titleOfInvention | Small feature patterning process required for advanced patterning |
| abstract | A method of forming a microelectronic structure is shown. The method includes the formation of a T-shaped structure using a controlled undercut formation process and the deposition of a selectively etchable composition within the undercut area of the T-shaped structure. Next, the T-shaped structure is removed, resulting in a feature in which a very small undercut is formed that matches the width of the undercut area of the T-shaped structure and optionally the height. These methods can be combined with other conventional patterning methods for making structures with very small feature sizes, regardless of the wavelength of light used for patterning. [Selection] Figure 1 |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2015090908-A |
| priorityDate | 2010-12-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 58.