http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2014223578-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_c97f90ab12b35b650d5fd039ed7a41a5 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B32B27-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B05D7-24 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B05D3-06 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B32B9-00 |
| filingDate | 2013-05-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_85bd0568fa9259aca0e60384a4d200da http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9c13b290917b1a997bcc7086cdf9a35e |
| publicationDate | 2014-12-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2014223578-A |
| titleOfInvention | Method for producing gas barrier film |
| abstract | A method for producing a gas barrier film having high gas barrier properties and excellent storage stability under high temperature conditions is provided. A method for producing a gas barrier film having at least one gas barrier film on a film substrate, comprising: (1) a silicon oxide precursor or a silicon oxynitride precursor on the film substrate. A step of applying a solution to form a coating film, (2) a step of irradiating the coating film with ultraviolet light containing a wavelength component of less than 200 nm, and (3) a wavelength of 200 nm or more and less than 230 nm on the coating film. A process for irradiating with ultraviolet light. [Selection figure] None |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2016183235-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-WO2018180975-A1 |
| priorityDate | 2013-05-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 206.