| abstract |
A polishing liquid capable of reducing defects while suppressing a decrease in smoothness and an increase in foreign matters in polishing an object to be polished containing silicon. A polishing liquid for polishing an object to be polished containing silicon, which contains abrasive grains, hydroxypropylmethylcellulose, a surfactant, and water, and has a pH of 4.5 or more and 8.0. Less than the polishing liquid. [Selection figure] None |