Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_fcc0b66123940d1b32783569ebfa2d45 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-32 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F220-28 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
filingDate |
2013-05-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f9473e6941c583ff6ee73ad721e18287 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_fa485c7f56d146cd9f855a87b1388ab7 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8489d83b3345b1464d93f71d0b822767 |
publicationDate |
2014-07-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
JP-2014139650-A |
titleOfInvention |
Photoresist composition, resist pattern forming method, polymer and compound |
abstract |
Provided is a photoresist composition having excellent EL performance, LWR performance, and CDU performance. A photoresist composition containing a polymer having a structural unit (I) represented by the following formula (1) and an acid generator. [Selection figure] None |
isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2016173513-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2020003678-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-7117910-B2 |
priorityDate |
2012-12-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |