| abstract |
[PROBLEMS] To provide high transparency to radiation and excellent basic physical properties as a resist such as sensitivity, resolution, dry etching resistance, and pattern shape, in particular, excellent solubility in a resist solvent, and line edge of a pattern after development. Reduce roughness. An acrylic polymer includes at least one repeating unit selected from repeating units represented by the following formula (1) and the following formula (2), and the radiation-sensitive resin composition includes the acrylic polymer. Contains coalescence and acid generator. [Chemical 1] [Selection] None |